Optical metrology for in-situ measurements

ABSTRACT

A method and system are presented for use in controlling a process applied to a patterned structure having regions of different layered stacks. The method comprises: sequentially receiving measured data indicative of optical response of the structure being processed during a predetermined processing time, and generating a corresponding sequence of data pieces measured over time; and analyzing and processing the sequence of the data pieces and determining at least one main parameter of the structure. The analyzing and processing comprises: processing a part of said sequence of the data pieces and obtaining data indicative of one or more parameters of the structure; utilizing said data indicative of said one or more parameters of the structure and optimizing model data describing a relation between an optical response of the structure and one or more parameters of the structure; utilizing the optimized model data for processing at least a part of the sequence of the measured data pieces, and determining at least one parameters of the structure characterizing said process applied to the structure, and generating data indicative thereof.

TECHNOLOGICAL FIELD

The present invention is generally in the field of optical measurementtechniques, and relates to an optical method and system for use in thein-situ measurements of parameters of structures beingprocessed/manufactured. The invention is particularly useful insemiconductor industry for controlling various processes in themanufacture of patterned structures (semiconductor wafers).

BACKGROUND

Generally, in the field of production of patterned structures, it isknown to control the process of pattern creation by one or more ofintegrated, in-situ, and stand alone optical measurement techniques.

For example, U.S. Pat. No. 6,764,379, assigned to the assignee of thepresent application, describes the use of integrated technique and alsoa combination of the integrated and in-situ techniques for monitoringthe processing of a stream of substantially identical articlesprogressing on a production line. First, an in-situ technique is appliedto identify and terminate the processing upon detecting an end-pointsignal, where the latter corresponds to a predetermined value of acertain parameter of the article being processed. Upon completing theprocessing in response to the end-point signal, generated by anend-point detector continuously operating during the processing of thearticle, integrated monitoring is applied to the processed article tomeasure the value of said parameter. The measured value of the desiredparameter is analyzed to determine a correction value to be used foradjusting the end-point signal to be used for properly terminating theprocessing of the next article in the stream.

GENERAL DESCRIPTION

There is a need in the art for a novel approach for in-situ monitoring aprocess of manufacturing patterned structures of the type havingdifferent layered stacks within a structure.

Generally, advantage of in-situ measurements over integrated and standalone techniques resides in possibility of measuring on the samestructure as the process advances. This enables controlling the productand process parameters in real time, practically without interruptingthe process, and enabling real-time detecting the process end-point andcontrolling the process parameters. The interpretation of in-situmeasured data is a complicated task, and conventional techniques of thekind specified are not sufficiently accurate, mainly because in-situmeasurements are affected by irregular environment characteristics,mechanical movement of the structure under processing/measurements, etc.Also, in-situ optical measurements unavoidably have lower spatialresolution, as they require relatively large size of a measurement spot.In case of a patterned structure having different layers stacks the useof such a large spot results in that a measurement spot includesportions of different stacks, e.g. different patterns. Morespecifically, in-situ optical, e.g. spectral, measurements are usuallydone with spot that is much larger than the specially designed scribeline test structures (50 by 50 micron). Usually, spot size on the wafersurface is about a few millimeters and higher in diameter, that iscomparable/larger than the die size. Measured signal in case of such“large” spot could be a combination of signals reflected from allfeatures in the measured spot. In other words, the in-situ opticalmeasurements have strong signal dependency on wafer's pattern.

The present invention provides a novel technique for use in the in-situoptical measurements. This novel technique is based on the inventors'understanding that in-situ optical measurements provide measured data inthe form of a sequence of data pieces measured over time as the processapplied to the structure proceeds. Such a sequence of data piecesprovides a map of structure's profile variation in time. This enablesreal-time modeling of the structure profile, i.e. optimizing a modeldescribing the relation between the structure profile and opticalresponse of the structure. Thus, the profile parameters of the structurecan be extracted from the dynamically optimized model based on the timeseries of in-situ optical signals (signatures), e.g. spectra,angle-resolved, elipsometric parameters, spectro-ellipsometer (SE)parameter, etc.

It should be understood that real-time profile modeling approach of theinvention is different from the regular scatterometry (opticalcritical-dimension, OCD) modeling, in both the profile definition andalgorithms for data interpretation. The real-time profile modelingtechnique of the invention may utilize standard OCD and/or othermeasurement results of any relevant feature or features on the samepatterned structure (wafer) to fine tune the accuracy and timing ofreal-time profile predictions, both for the current run (using premeasurements or splitting the real-time dataset series into sub-serieswhich can be analyzed with different algorithms) and for next run (usingafter-process measurements). It should also be noted that multipleoptical detectors (of the same or different types) can be used forin-situ measurements of the same spot on the structure and/or differentmultiple spots on the structure.

The present invention provides a dedicated technique for enhancing thestability and robustness of measurements utilizing the real-time profilemodeling of the invention. According to the invention, a time sequenceof several measurements is used in different ways to allow tracking ofthe processes and to use constraints that connect the sequence in a waythat is consistent with the process and modeling.

In some embodiments, the invention utilizes a combined time sequence ofmeasurements. Instead of using looking at each signature (e.g.,spectrum) as representing specific structure, as traditionally done inscatterometry measurements, the real-time profile modeling approach ofthe invention is based on analyzing, at any point of time (in real timeduring the process), the entire set of measurements, being a sequence ofdata pieces measured over time from the beginning of the process tillthe current moment. In other words, the technique of the invention usesthe history of the process, where all the already measuredframes/signals (preceding measured data pieces) are available for theanalysis, and always the entire sequence of the results ofinterpretations of previously measured spectra is used for trendanalysis and prediction. A prediction model is build at each point oftime based on the entire sequence of available previous interpretationresults, and is used for automatic estimate of starting point for nextinterpretation(s) and for automatic estimate for interpretation ranges.In addition, a prediction model can trigger switching between differentsearch algorithms in the sequence of time frames, to either allow fasterconvergence when stable solution is achieved or reduce the number offloating parameters by opening/closing parameters based on prediction.

In some other embodiments, the invention provides measured dataprocessing technique utilizing multiple raw data signals. This techniqueallows direct fit of time derivative of the process (e.g. etching)related parameters. A software product or user can define variableparameters that can be used for this purpose, e.g. the main etchparameters such as the etch rate in different materials. For theseparameters, prior information may be also used as s starting point orprediction (for example averaged, known or expected etch rate). The dataanalysis technique first tests whether previous fit results define aclean enough prediction trend and/or match an expected trend. If this isthe case, then the successive measured spectra are fitted in groups,adding the derivative with time of fit parameter as fit parametersthemselves. Actual calculation can be done only for part of the spectrain the group and results are interpolated along time axis the rest ofspectra. The time sequence of measured data pieces indicative of opticalresponses (e.g. spectra) of the structure under measurements isautomatically segmented in groups according to estimated linearity of achange of the optical response (spectral change) in time.

In some embodiments, the invention utilizes confidence factorcalculation and use. The purpose of this feature is to give somequantitative measure of what is the confidence of interpretation resultsfor some measured data (spectrum) in measurement time sequence. Lowconfidence of fit results is defined based on the difference betweenresults and trend for the change for fitted parameters values, in time.It is possible to implement this feature in a very basic way, forexample calculating the ratio between the deviation of the current pointfrom estimated trend for previous in time points, especially for processsubsteps where the expected trend/process rate is known. The larger thedeviation compared to the standard deviation of the estimated trend, thelower is the confidence limit of the current point. This information maybe integrated with the estimation of the trend, to make it more robustto cases where the estimation of the trend becomes unclear. This is inparticular relevant when working online where not all signals may beinterpreted in time. Confidence factor may be used to filter certainpoints from the trend estimation or prediction models to make them morerobust.

Thus, according to one broad aspect of the invention, there is provideda method for use in controlling a process applied to a patternedstructure having regions of different layered stacks. The methodcomprises:

-   -   (a) sequentially receiving measured data indicative of optical        response of the structure being processed during a predetermined        processing time, and generating a corresponding sequence of data        pieces measured over time;    -   (b) analyzing and processing the sequence of the data pieces and        determining at least one main parameter of the structure,        wherein said analyzing and processing comprises:        -   1) processing a part of said sequence of the data pieces and            obtaining data indicative of one or more parameters of the            structure,        -   ii) utilizing said data indicative of said one or more            parameters of the structure and optimizing model data            describing a relation between an optical response of the            structure and one or more parameters of the structure;        -   iii) utilizing the optimized model data for processing at            least a part of the sequence of the measured data pieces,            and determining at least one parameters of the structure            characterizing said process applied to the structure, and            generating data indicative thereof.

In some embodiments, the obtained data indicative of the one or moreparameters includes information about one or more secondary parametersof the structure, being relatively weak and slowly varying with theprocess applied to the structure; and/or one or more secondaryparameters of the structure, being substantially not affected by theprocess applied to the structure. The at least one determined parameterof the structure characterizing said process applied to the structuretypically includes at least one structure parameter being relativelystrong and fast varying with the process applied to the structure.

Secondary parameters are parameters that either are substantially notaffectable by the process applied to the structure or are relativelyweak and slowly varying with the process, while main parameters arerelatively strongly and quickly varying with the process.

The part of the sequence of data pieces from which said one or moreparameters is obtained comprises preceding data pieces corresponding toan initial time interval of the processing time. The at least part ofthe sequence processed for the determination of the at least oneparameter of the structure characterizing the process applied to thestructure comprises the data pieces corresponding to a successive timeinterval of the processing time.

In some embodiments, the processing of the preceding data piecescomprises: utilizing data about behavior of said one or more parametersof the structure during application of said process, and obtaining dataabout each of said one or more parameters at one or more points of timewithin the initial time interval corresponding to the one or more of thepreceding data pieces; and generating model optimization data. The modeloptimization data may comprise a fixed value for each of the one or moreparameters, or a fixed range of change of value for each of the one ormore secondary parameters over time.

The at least one parameter characterizing the process applied to thestructure may comprise at least one of the following: an etch depth,thickness of a material being deposited, and thickness of a remainingmaterial during a material removal process. The one or more parametersfor which data is obtained while processing initial data pieces maycomprises at least one of side wall angle, rounding, thickness of atleast one layer in the stack (e.g. underneath layer).

In some embodiments, the determination of the at least one parameter ofthe structure characterizing the process applied to the structurecomprises segmenting in groups the at least a part of the sequence ofthe measured data pieces, according to estimated linearity of timechange of the optical response.

According to another broad aspect of the invention, there is provided acontrol system for use in controlling a process applied to patternedstructures. The control system is a computer system comprising:

data input utility for receiving measured data indicative of opticalresponse of a structure being processed by said process during apredetermined processing time, and generating a corresponding sequenceof data pieces measured over time;

a processing utility configured and operable for analyzing andprocessing the sequence of the data pieces and determining at least onemain parameter of the structure characterizing the process applied tothe structure, wherein said processing utility comprises:

-   -   a structure analyzer configured and operable for processing a        part of said sequence of the data pieces and obtaining data        indicative of one or more parameters of the structure,    -   a model optimization module configured and operable for        utilizing said data indicative of the one or more parameters of        the structure and generating model optimizing data for        optimizing a model describing a relation between an optical        response of the structure and parameters of the structure;    -   a model-base parameter calculator configured and operable for        utilizing the optimized model data for processing at least a        part of the sequence of the measured data pieces, and        determining the at least one parameter of the structure        characterizing said process applied to the structure, and        generating data indicative thereof.

In yet further aspect of the invention, it provides a measurementssystem for in-situ monitoring a process applied to a patterned structurehaving regions of different layered stacks, wherein the measurementsystem comprises an optical measurement unit configured and operable forperforming optical measurements on a structure being processed during acertain processing time t, and the above-described control system forreceiving the measure data, generating the corresponding sequence ofdata pieces measured over time, and processing said sequence anddetermining the at least one parameter of the structure characterizingthe process being applied to the structure. The optical measurement unitcomprises an illumination assembly for illuminating a measurement spoton the structure being processed to cause an optical response of thestructure, and a detection assembly for detecting the optical responseover said processing time t and generating measured data correspondingto the detected optical response over time.

BRIEF DESCRIPTION OF THE DRAWINGS

In order to better understand the subject matter that is disclosedherein and to exemplify how it may be carried out in practice,embodiments will now be described, by way of non-limiting example only,with reference to the accompanying drawings, in which:

FIG. 1 illustrates a block diagram of the main functional elements of asystem of the present invention for or use in controlling amanufacturing process of patterned structures; and

FIG. 2 is a flow chart of an example of a method of the presentinvention for processing in-situ measured data during a process appliedto a patterned structure.

DETAILED DESCRIPTION OF EMBODIMENTS

The present invention provides a novel method and system for use inprocess control in the manufacture of a patterned structure of a typehaving regions of different layered stacks, such as semiconductorwafers.

Referring to FIG. 1, there is illustrated, by way of a block diagram, acontrol system, generally designated 10, configured and operableaccording to the present invention for processing optical measured dataobtained from a patterned structure under processing, such as etching orpolishing. The control system 10 is typically a computer system havinginter alia such modules/utilities (software and/or hardware) as datainput utility 12, memory utility 14, and data processing and analyzingutility 16.

As shown in the figure, the control system 10 is a part of a measurementsystem 100 and is associated (connectable, via wires or wireless signaltransmission, to) an optical measurement unit 18 and possibly also aprocessing system 20. The construction and operation of such measurementunit and processing system are know per se and do not form part of thepresent invention, and therefore need not be specifically described,except to note the following: A structure W undergoes certainprocessing, such as etching, by a processing tool 22, whose operation iscontrolled by a process controller 24. The measurement unit 18 isconfigured and operable for performing in-situ optical measurements on apatterned structure such as a semiconductor wafer W progressing on aproduction line. To this end, the measurement unit 18 includesappropriate illumination and detection assemblies 26 and 28. Theseassemblies may have any suitable configuration, operable in dark and/orbright field detection mode. The optical measurement unit 18 appliesoptical measurements, e.g. spectrometric measurements, to the structureW being processed during a certain processing time t.

It should be noted, although not specifically shown, that themeasurement unit 18 may be configured for additionally carrying outintegrated measurements, which can be carried using the same ordifferent illumination and/or detection assemblies. The principles ofthe integration measurements are known per se and need not be describedin details.

For the purposes of the present invention, the integration measurementsmight be additionally used to provide data about one or more parametersof the structure. These may be for example structure parameterssubstantially unaffectable by the process.

As will be described more specifically further below, in someembodiments of the invention, secondary parameter(s) may be determinedat the initial stage of measured data processing and then used fordetermining one or more desired parameter(s) of the structurecharacterizing the process parameter(s) that is/are to be controlled.Such structure parameter(s) is/are referred thereto as mainparameter(s), being relatively strong and quickly varying with theprocess applied to the structure. In some embodiments, the determinationof one or more secondary parameters may utilize one or more parametersmeasured by the integration measurement system. It should also be noted,although not specifically shown that the detection assembly of thein-situ measurement unit, as well as the integrated measurement unit, ifany, may utilize multiple (at least two) detectors of different types.

For example, for basic lithography processes, the one or more main,process-related, structure parameters (usually one or very few) includeetch depth, thickness of a layer being deposited, thickness of aremaining layer in the material removal process, etc., that actuallydescribe the in-situ process. As for the secondary process-relatedstructure parameters, they may for example include side wall angle,rounding, etc., that are relatively weak and are slowly varying with theprocess, or practically having substantially “constant” profile, i.e.parameters that do not vary with the process or vary within a certainwell defined range, such as thicknesses of some layers (typically anunderneath layer) that can vary from structure to structure but are thesame for each structure (determined only by previous process steps).

Turning back to FIG. 1, output of the detector 28 (e.g. appropriatelyformatted for transmission to the control system 10) is thus in the formof a sequence, S(DP_(t) ₁ , DP_(t) ₂ , . . . , DP_(t) _(n) ), of datapieces DP corresponding to sequential measurement sessions performed atsuccessive points/segments t₁, t₂, . . . , t_(n) of at least a part ofthe processing time t. Each such measured data piece is indicative of anoptical response of the structure within the illuminated spot thereon(measurement spot) at a respective time point/segment of the processingtime.

The control system 10 may, in some embodiments, utilize certainprocess-related data and/or structure-related data, which may bea-priori known and/or obtained during the initial measurementsession(s), and these data may be stored in the memory utility 14. Alsostored in the memory 14 is certain model data, including one or moremodels. The model describes a relation between the optical response ofthe structure and one or more parameters of the structure. The modeldata is used for interpreting the measured data to enable determinationof various structure parameters. A change/profile of one or morestructure parameters during at least a part of the processing time isindicative of one or more process parameters that is/are to becontrolled.

Thus, measured data corresponding to successive measurements over timeis sequentially received by the input utility 12 of the control system10, which generates in a corresponding sequence of data pieces, S(DP_(t)₁ , DP_(t) ₂ , . . . , DP_(t) _(n) ), which is processed by theprocessing utility 16. The processing utility 16 includes a structureanalyzer module 30 which is configured and operable for analyzing thesequence of measured data pieces, and determining data indicative of oneor more parameters, P_(i), of the structure W. The latter is/are thenused by a model optimization module 32 of the processing utility 16 foroptimizing the model data. As the processing of the structure and theoptical measurements thereon proceed, the model data may be dynamicallyoptimized based on the preceding measured data pieces forinterpreting/analyzing the successive measured data pieces. Amodel-based parameter calculator utility/module 34 utilizes theso-obtained optimized model data for analyzing the successive measureddata pieces and determining at least one parameter of the structurecharacterizing the process applied to the structure, and generatingoutput data indicative of such at least one desired parameter.

The desired structure parameters are those characterizing one or moretunable/controllable parameters of the process applied to the structureand may be used by a process analyzer 36 to generate respective controlsignal to the processing tool. The process analyzer 36 may be a part ofthe control system 10, or may be a part of the process controller of theprocessing system, or a separate computer system interconnectablebetween the control system 10 and the processing system; as well assoftware utilities of the process analyzer may be appropriatelydistributed between the control system and the processing system, as thecase may be.

In some embodiments, the initially obtained data about one or moreparameters P_(i) of the structure include preliminary estimate, e.g.range of values, of a specific parameter, which data is used foroptimizing the model, and then the successive data pieces are analyzedusing the optimized model to determine the exact value P_(j) of the sameparameter.

In some other embodiments, the initial parameters P_(i) are secondaryparameters which are either constant parameters of the structure orparameters less sensitive to the process applied to the structure, ascompared to the main structure-related parameters P_(j) that are used tocharacterize the process. It should be understood that the mainparameters P_(j) may include the values of one or more of the secondaryparameters P_(i) as well.

Reference is made to FIG. 2 exemplifying a flow chart 200 of a method ofthe present invention for use in monitoring a process applied to apatterned structure of the kind having regions of different layeredstacks. First, initial model data is provided (step 202) and stored in amemory utility accessible by the control system (e.g. the memory utilityis a part of the control system, or of a separate storage deviceaccessible via a communication network). As indicated above, the modeldata describes a relation (function) between the optical response of thestructure (corresponding to the type of optical measurements used) andthe parameters of the structure, including those characterizing theprocess being applied to the structure.

Measurements are continuously or periodically applied to the structurewhile the structure is being processed, during a processing time t. Themeasured data is sequentially received at the control system during atleast a part t_(n) of the processing time t and the control systemoperates to dynamically generate a sequence, S(DP_(t) ₁ , DP_(t) ₂ , . .. , DP_(t) ^(n)) of measured data pieces (step 204). Generally, a part(initial part) of the sequence of the measured data pieces is analyzedusing the initial model data, model optimizing data is determined, andthe optimized model is generated (step 206). The optimized model is thenused for the analysis of the successive data pieces and at least onedesired parameter of the structure is determined (step 208). Asindicated above, the model optimization may include “quick”determination (i.e. from one or a few initial data pieces) of one ormore parameters of the structure the values of which can be fixed in themodel.

As shown in this specific but not limiting example, the model dataoptimization stage 206 may also be a dynamic procedure, namely each (orperiodically taken) set/stream of the preceding data pieces is used fordetermining one or more parameters for optimizing the model data (steps206A), the so-optimized model data is used for determining one or moreparameters of the structure from a successive set/stream of data piecesand these parameters enables further optimization of the model data(steps 206B), and so on, as shown in the figure in dashed lines. Suchdynamic optimization of the model data proceeds until the finaloptimized model data is obtained allowing determination of the at leastone desired parameter of the structure with sufficient accuracy.

More specifically, the analysis of the initial/preceding part S_(k) ofthe sequence of the data pieces, corresponding to an initial/precedingtime interval t_(k)<t_(n), is used to obtain initial/preceding dataabout one or more parameters (e.g. determine one or more secondaryparameters) of the structure, as will be described further below. Suchinitial/preceding data about one or more parameters (e.g. values orrange of values of secondary parameters) is used for optimizing themodel data (steps 206A, 206B). For example, the values or ranges ofvalues of secondary parameters are “fixed” in the model.

The measured data pieces continue to be received at the control systemduring successive measurement sessions, and analyzed by the controlsystem using the optimized model data, to thereby determine value(s) ofstructure parameter(s) P_(j) (e.g. main parameters) characterizing theprocessing of the structure (step 208). As described above, the part ofthe structure parameters characterizing the processing, e.g. at leastone such parameter, may be further used for dynamically optimizing themodel, and the optimized model is then used for the determination ofother parameters of the structure or determination of the value of thesame parameter with higher accuracy. The determined structure parametersmay be used for estimating/analyzing one or more of the processparameters that affect such main structure parameters (optional step210) and corresponding control signals are generated to the processingsystem.

There are several options for analysis of the initial sequence of datapieces and the use of the results for model data optimization andestimation/determination of the at least one parameter of the structurecharacterizing the structure. The use of such parameter attributes as asecondary and main parameters (or initially and successively determinedparameters) during the fitting of the process sequence together withworking with entire set of measurements performed from the beginning ofthe process till the current moment allow performance optimization.

For all “constant” secondary parameters, the processing utility uses asmany points as required to find out a proper value and fix this value asearly in the measurement sequence as possible. For all “non-constant butweakly variable” secondary parameters, the processing algorithm mayassume small consistent changes through a process, or maybe even assumedconstant for a localized (in time) process sequence steps. For the mainparameters, the processing algorithm may assume expected behavior withtime based on “known” average process rate (e.g. etch rate, or materialremoval rate, or material deposition rate), and can assume similarbehavior for a localized (in time) process sequence steps (locallylinear or non liner dependence with the same function).

Similar definition of profile parameters is done for all patterns(stacks) used for calculation of the expected returned signal (opticalresponse). Parameters of different stacks are connected in a flexibleprocess related way. Calculation of the optical responses or signatures(spectra) from multiple stacks could be used for accounting for therelative weights of the stacks and fine geometrical definitions of theplacement of stacks in the measurement spot. In addition,characteristics of incident light (optical system) is taken into accountin calculations.

The measurement unit may utilize standard OCD and/or other measurementresults (including same/different in-situ detectors).

In some embodiments, the control system of the invention utilizesexternal injection of preliminary measurements for determination of oneor more parameters of the structure. For example, as indicated above,the secondary “constant” parameters that do not vary with the processneed to have their value determined and fixed as soon as possible(either before the process starts or during the first, initial part ofthe process). To this end, as indicated above, preliminary measurementcould be done in the same or other process chamber by another in-situsensor, and/or outside the process chamber using integrated metrologyand/or any stand alone tool, to determine relevant structure and/orprocess parameters (all or at least some profile parameters, includingthicknesses of deposited layers) for in-situ measurements. These valuescould be injected into the model (“constant” profile parameters) and/orused as a starting point for interpretation (main and secondary processparameters). Measurements can be done on all relevant sites on thewafer, and only relevant information will be injected. The example of acombined system comprising In-Situ (End-Point) and Integrated Metrologysub-systems useful for the present invention technique (e.g. based onzero-order normal incidence spectrophotometer) is disclosed in U.S. Pat.No. 6,764,379 assigned to the assignee of the present application. Thisdocument is therefore incorporated herein by reference with respect tothese specific examples.

In some embodiments, the control system of the invention utilizesexternal injection preliminary measurements for spectral information.More specifically, signals returned (e.g. reflections) from differentstacks within the measurement spot are combined into the in-situ commonsignature (e.g. reflectance spectra). Each one of these different stackscan be measured by integrated and/or stand alone system (e.g.commercially available from Nova Measuring Instruments Ltd.) providingmeasurement of the relatively small spot of 10-50 microns at exactlocation on the wafer. These precise preliminary measurements may beinjected and used to “modify” the measured in-situ signal, by removingfrom this signal reflection coming from non periodicalstructures/patterns in the wafer that are hard to model. Such removal ofinfluence of non periodical patterns allows for better converging theprocessing of measurement of endpoint for memory in-die array.

In some embodiments, the control system of the invention utilizesexternal injection of post-measurements for profile parameters. Morespecifically, in addition to preliminary measurements information, postmeasurement data can also be used, if needed, to adjust certainparameters of the solution or recalculate certain default factors andassumptions used by the data processing algorithm. These values may beinjected into the model (“constant” profile parameters) and/or used as astarting point for interpretation.

In some embodiment, internal injection for profile parameters can beused. In majority of modern processes there are multiple steps used togenerate the required result in the same chamber. In-situ monitoring ofthe entire process may cover all the steps, or any subset of steps.There may be a case where instead of single recipe for all stepsmultiple recipes are used, each recipe being optimized for a certainprocess step. In this case, each previous recipe in the sequence mayinject all relevant parameters to the next recipe. These values areinjected into the model (“constant” profile parameters) and/or used as astarting point for interpretation (main and secondary processparameters).

As indicated above, the measurement unit may utilize multipleillumination/detection units or multiple detectors associated with thesame illumination assembly, thus allowing parallel (simultaneous)processing of information from multiple detectors. In case additionaldetectors are used in-situ, information from these detectors can be usedin real time to improve prediction results, both as injection ofrelevant information about the process, and as an additional signal/sthat can be used together to do the job. If multiple detectors are“looking” at different locations on the wafer, then across the wafersignatures (optical responses) may be determined and controlled throughthe process. This is especially important for the processes where waferposition changes relative to the detector/s during the process. One ofthe examples of such processes is Chemical Mechanical Planarization(CMP), where wafers are moving above the fixed detectors. Informationabout relative position of the wafer to the detectors together with thesimultaneous interpretation of the information from multiple detectorsallows to control both the CMP rate and the across the wafer uniformity.

Information from different detectors and/or process related parameters,such as plasma/gas/composition/etc. changes may be incorporated into thedata processing algorithm to allow optimal convergence. A particularexample is the impact of change in effective ambient (whether it isplasma gas or etch by product) on the measured spectrum, where for someprocess steps the effective ambient of the measurement cannot beapproximated to vacuum without affecting the accuracy of the reportedgeometrical profile parameters. In such cases, the ambient needs to beaccurately described (optically). Such ambient might depend ontool/process/wafer stack/gas/plasma/etc. parameters, and receiving suchdetailed instantaneous information from the process tool can help toselect the right ambient model for the instantaneous modelrepresentation and accurate profile measurement.

The invention claimed is:
 1. A method for use in controlling a multi-step process of manufacturing patterned structures applied to the structure through a sequence of the multiple steps, the method comprising: providing data indicative of multiple recipes, wherein each recipe is optimized for at least one process step in said sequence of steps; and performing in-situ optical measurements on a structure over a processing time as the process applied to the structure proceeds through a sequence of at least a subset of the multiple steps, while the structure is located in the same processing chamber, said performing of the optical measurements comprising: (a) sequentially receiving measured data over said processing time, the measured data being indicative of variation of optical response of the structure corresponding to variation of structure's profile during the processing caused by changes in one or more parameters of the structure induced by said at least sub-set of the multiple steps of the process applied to the structure; and (b) analyzing and processing a sequence of the measured data to determine, at any selected point of time within said processing time, one or more parameters of the structure characterizing the process applied to the structure, wherein said analyzing and processing comprises: utilizing said data indicative of the multiple recipes optimized for the process step in said sequence of steps for dynamically optimizing data interpretation models describing a relation between a theoretical structure profile and an optical response of a theoretical structure similar to the structure under measurements; and performing fitting procedures between the optimized models and the respective measured data in the sequence to determine the one or more parameters of the structure.
 2. A method according to claim 1, wherein said utilizing of the data indicative of the multiple recipes, comprises using a previous recipe corresponding to a previous step in the sequence of steps to inject one or more values of structure parameters into a next recipe corresponding to a next step in the sequence of step.
 3. A method according to claim 1, wherein said analyzing and processing of the sequence of the measured data comprises utilizing data indicative of the at least one parameter of the structure characterizing the process applied to the structure and segmenting at least a part of the sequence of the measured data, according to estimated function of variation of the optical response of the structure through the process steps.
 4. A method according to claim 1, wherein said analyzing and processing of the sequence of the measured data comprises utilizing a time sequence of measurements to track the process steps applied to the structure and use constraints connecting the time sequence with the process and the multiple recipes.
 5. A method according to claim 1, wherein at least some measured data pieces in said sequence of measured data corresponds to detection of the optical response of the same location on the structure by multiple detectors, said analyzing and processing of the measured data comprising processing information from the multiple detectors and obtaining information about the process; and optimizing the data interpretation model by injecting the information about the process.
 6. A method according to claim 1, wherein at least some measured data pieces in said sequence of measured data corresponds to detection of the optical responses of different locations on the structure by multiple detectors, said analyzing and processing of the measured data comprising determining a measured data piece, of the sequence of the measured data, indicative of a measured signature formed by the optical responses; and optimizing the data interpretation model describing a theoretical optical response signature.
 7. A method according to claim 6, wherein said analyzing and processing of the measured data comprises utilizing position data about relative position of the structure with respect to the multiple detectors and simultaneous interpretation of multiple measured data pieces from the multiple detectors allows, and generating control data about a process rate a profile of a parameter of the structure across the structure.
 8. A method according to claim 1, wherein said analyzing and processing comprises: analyzing, at any point of time within said processing time, a set of measurements, being a sequence of the measured data pieces measured over time from the beginning of said processing time till said point of time.
 9. A method according to claim 2, wherein the one or more values are injected into the data interpretation model, being values of dimensional parameters.
 10. A method according to claim 2, wherein the one or more values are injected into the data interpretation model to form a starting point for interpretation of the measured data.
 11. A method according to claim 10, wherein said analyzing of the measured data comprises, at each point of time building a prediction model based on the entire sequence of the measured data measured over time from a beginning of said processing time till said selected point of time and corresponding entire sequence of model-based interpretation results including the one or more values of the parameters; and using the prediction model for automatic estimate of the starting point for next interpretation of the measured data piece and for automatic estimate for interpretation ranges.
 12. A method according to claim 1, wherein said dynamically optimizing the model further comprises external injection of one or more values of the structure's parameters determined in post measurements.
 13. A method according to claim 12, wherein the one or more values of the structure's parameters are injected into the data interpretation model to form constant profile parameters of the model.
 14. A method according to claim 12, wherein the one or more values of the structure's parameters are injected into the data interpretation model to form a starting point for interpretation of the measured data in said sequence of the measured data.
 15. A method according to claim 1, wherein said dynamically optimizing the model further comprises external injection of data indicative of preliminary measurements on the structure, said external injection of the data indicative of the preliminary measurements modifying the in-situ measured data.
 16. A method according to claim 15, wherein said data indicative of the preliminary measurements corresponds to measurements on different structure sites including specular reflections from the structure, and is injected into the in-situ measured data comprising a reflectance spectra of the structure, thereby modifying the in-situ measured data, by removing from the in-situ measured data signals associated with reflections of non periodical pattern in the structure being measured.
 17. A method according to claim 1, wherein said one or more parameters of the structure characterizing the process applied to the structure comprise at least one of an etch depth, thickness of a material being deposited, and thickness of a remaining material during a material removal process.
 18. A method according to claim 1, wherein said one or more parameters comprises one or more of the following: side wall angle, rounding, thickness of at least one layer in the stack.
 19. A method according to claim 1, wherein said measured data comprises spectral data.
 20. A control system for use in controlling a multi-step process of manufacturing of patterned structures, the control system being a computer system configured and operable for performing the method of claim
 1. 